Thin Photopatterned Micropolarizer Array For Cmos Image Sensors

• doi: 10.1109/LPT.2009.2018472
• title: Thin Photo-Patterned Micropolarizer Array for CMOS Image Sensors
• publisher: IEEE
• isbn:
• issn: 1941-0174
• rank: 3831
• access_type: LOCKED
• content_type: Journals
• abstract: We fabricated and characterized a thin photo-patterned micropolarizer array for complementary metal-oxide-semiconductor (CMOS) image sensors. The proposed micropolarizer fabrication technology completely removes the need for complex selective etching. Instead, it uses the well-controlled process of ultraviolet photolithography to define micropolarizer orientation patterns on a spin-coated azo-dye-1 film. The patterned polymer film micropolarizer (10 mum x 10 mum) exhibits submicron thickness (0.3 mum) and has an extinction ratio of ~ 100. Reported experimental results validate the concept of a thin, high spatial resolution, low-cost photo-patterned micropolarizer array for CMOS image sensors.
• article_number: 4810130
• pdf_url: https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=4810130
• html_url: https://ieeexplore.ieee.org/document/4810130/
• abstract_url: https://ieeexplore.ieee.org/document/4810130/
• publication_title: IEEE Photonics Technology Letters
• conference_location:
• conference_dates:
• publication_number: 68
• is_number: 4967995
• publication_year: 2009
• publication_date: June15, 2009
• start_page: 805
• end_page: 807
• citing_paper_count: 74
• citing_patent_count: 0
• download_count: 920
• insert_date: 20090403
• index_terms:
  • ieee_terms:
    • Sensor arrays
    • CMOS image sensors
    • Image sensors
    • Fabrication
    • CMOS technology
    • Etching
    • Lithography
    • Polymer films
    • Extinction ratio
    • Spatial resolution
  • author_terms:
    • Complementary metal–oxide–semiconductor (CMOS) image sensor
    • micropolarizer array
    • polarization imaging
  • dynamic_index_terms:
    • Image Sensor
    • Camera Sensor
    • Thinned Array
    • High-resolution
    • High Spatial Resolution
    • Spin-coated
    • Photolithography Process
    • Extinction Ratio
    • Selective Etching
    • Fabrication Process
    • Linearly Polarized
    • Propagation Direction
    • Glass Substrate
    • Circularly Polarized
    • Performance Of Array
    • Array Operation
    • Stokes Parameters
    • Stokes Vector
    • Polarization Imaging
• authors:
  • Author Name: Xiaojin Zhao
    Affiliation: Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Hong Kong, China
    Author URL: https://ieeexplore.ieee.org/author/38550947700
    ID: 38550947700
    Order: 1
    Author Affiliations:
    • Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Hong Kong, China
    • School of Electrical Electronic and Computer Engineering, University of Western Australia, Crawley, WA, Australia
  • Author Name: Farid Boussaid
    Affiliation: School of Electrical Electronic and Computer Engineering, University of Western Australia, Crawley, WA, Australia
    Author URL: https://ieeexplore.ieee.org/author/37265532500
    ID: 37265532500
    Order: 2
    Author Affiliations:
    • School of Electrical Electronic and Computer Engineering, University of Western Australia, Crawley, WA, Australia
  • Author Name: Amine Bermak
    Affiliation: Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Hong Kong, China
    Author URL: https://ieeexplore.ieee.org/author/37275353200
    ID: 37275353200
    Order: 3
    Author Affiliations:
    • Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Hong Kong, China
  • Author Name: Vladimir G. Chigrinov
    Affiliation: Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Hong Kong, China
    Author URL: https://ieeexplore.ieee.org/author/37392987100
    ID: 37392987100
    Order: 4
    Author Affiliations:
    • Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Hong Kong, China

Image Sensor

• sensor_type: CMOS
• resolution: Not specified
• dynamic_range: Not specified
• pixel_size: 10 mµm
• dark_current: Not specified

Optical Data

• focal_length: Not specified
• aperture: Not specified
• field_of_view: Not specified
• distortion: Not specified

Performance Metrics

Applications & Benefits

• cell_imaging: CMOS image sensors can be integrated into a variety of consumer electronic products such as smartphones, medical devices, and automotive systems.
• benefits: Advantages include system miniaturization and lower manufacturing costs.

Supporting Organizations

• supported_by: Research Grant Council of Hong Kong SAR, China

Manuscript Details

• publication_date: June15, 2009

Relevancy Score

• score: 9
• missing_fields:
  • resolution
  • dynamic_range
  • dark_current
  • focal_length
  • aperture
  • field_of_view
  • distortion
  • frame_rate
  • signal_to_noise_ratio
  • sensitivity
  • shutter_speed
  • power_consumption
  • noise

Processed JSON Filename

request_2cd20456-5d37-4821-ac2d-78ef53279fb8-thin_photopatterned_micropolarizer_array_for_cmos_image_sensors.json