Reflowable Ism Wlp
- doi: 10.1109/ECTC.2008.4549985
- title: Reflowable ISM WLP
- publisher: IEEE
- isbn: 978-1-4244-2231-9
- issn: 2377-5726
- partnum: 08CH38006
- rank: 3431
- access_type: LOCKED
- content_type: Conferences
-
abstract: A new ISM (image sensor module) WLP (wafer
level package) for reflow process is designed, fabricated and tested.
The proposed ISM WLP is composed of polymer bonding layer, glass cap
wafer for particle free process and CIS (CMOS Image Sensor) chip wafer
which has micro via hole interconnection. During the last decades, WLP
is highlighted as the next generation ISM Package method for many
advantages like high yield (particle free process), small form factor
(3D interconnection), low assembly cost and so on. Nevertheless these
benefits, there are some difficulties like micro via hole fabrication,
low temperature insulation process (inside hole), bottom side oxide
etching process, warpage control according to wafer level bonding using
different material, and whole process temperature limitation for micro
lens damage. Among various fabrication methods for ISM package, COB
(Chip on board), COF (Chip on film), and L, T contact WLP from ShellCase
are generally used. In case of COB and COF package, it has difficulty in
particle control during assembly process. In case of ShellCase type WLP
has very complicated fabrication process. Additionally, most of above
package has disadvantage in size point of view. Through suggested ISM
WLP using thru interconnection via is realized. And we can good photo
image using fabricated WLP. It can not only solve problems of
conventional packaging structures but also tremendously reduce the
manufacturing & assembly cost (include time) of ISM package and realize
real chip scale package.
- article_number: 4549985
-
pdf_url:
https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=4549985
-
html_url:
https://ieeexplore.ieee.org/document/4549985/
-
abstract_url:
https://ieeexplore.ieee.org/document/4549985/
-
publication_title: 2008 58th Electronic Components and
Technology Conference
- conference_location: Lake Buena Vista, FL
- conference_dates: 27-30 May 2008
- publication_number: 4542565
- is_number: 4549927
- publication_year: 2008
- publication_date: 27-30 May 2008
- start_page: 297
- end_page: 302
- citing_paper_count: 2
- citing_patent_count: 0
- download_count: 165
- insert_date: 20080624
-
index_terms:
-
ieee_terms:
- Wafer scale integration
- Assembly
- Fabrication
- Chip scale packaging
- Wafer bonding
- Costs
- Process control
- Image sensors
- Process design
- Testing
-
dynamic_index_terms:
- Wafer-level Packaging
- Low Cost
- Fabrication Process
- Image Sensor
- Camera Sensor
- Etching Process
- Small Form Factor
- Microlenses
- Micro Lens
- Oxidative Etching
- Shear Stress
- Shear Strength
- Passivation Layer
- Surface Passivation
- Central Portion
- Scallop
- Low-temperature Process
- Copper Plate
- Dry Etching
- Etching Rate
- Pyrex Glass
- Glass Wafer
- Camera Module
- Electrical Interconnection
-
isbn_formats:
-
format: CD,
value: 978-1-4244-2231-9,
isbnType: New-2005
-
format: Print ISBN,
value: 978-1-4244-2230-2,
isbnType: New-2005
-
authors:
-
Author Name: Won Kyu Jeung
Affiliation: Samsung Electro Mechanics Company
Limited, Suwon, Gyeonggi, South Korea
Author URL:
https://ieeexplore.ieee.org/author/37087828168
ID: 37087828168
Order: 1
Author Affiliations:
-
Samsung Electro Mechanics Company Limited, Suwon, Gyeonggi,
South Korea
-
Author Name: Chang Hyun Lim
Affiliation: Samsung Electro Mechanics Company
Limited, Suwon, Gyeonggi, South Korea
Author URL:
https://ieeexplore.ieee.org/author/37087528481
ID: 37087528481
Order: 2
Author Affiliations:
-
Samsung Electro Mechanics Company Limited, Suwon, Gyeonggi,
South Korea
-
Author Name: Jingli Yuan
Affiliation: Samsung Electro Mechanics Company
Limited, Suwon, Gyeonggi, South Korea
Author URL:
https://ieeexplore.ieee.org/author/37087826981
ID: 37087826981
Order: 3
Author Affiliations:
-
Samsung Electro Mechanics Company Limited, Suwon, Gyeonggi,
South Korea
-
Author Name: Seung Wook Park
Affiliation: Samsung Electro Mechanics Company
Limited, Suwon, Gyeonggi, South Korea
Author URL:
https://ieeexplore.ieee.org/author/37088149367
ID: 37088149367
Order: 4
Author Affiliations:
-
Samsung Electro Mechanics Company Limited, Suwon, Gyeonggi,
South Korea
-
Author Name: Seog Moon Choi
Affiliation: Samsung Electro Mechanics Company
Limited, Suwon, Gyeonggi, South Korea
Author URL:
https://ieeexplore.ieee.org/author/37087296466
ID: 37087296466
Order: 5
Author Affiliations:
-
Samsung Electro Mechanics Company Limited, Suwon, Gyeonggi,
South Korea
-
Author Name: Sung Yi
Affiliation: Samsung Electro Mechanics Company
Limited, Suwon, Gyeonggi, South Korea
Author URL:
https://ieeexplore.ieee.org/author/37087255019
ID: 37087255019
Order: 6
Author Affiliations:
-
Samsung Electro Mechanics Company Limited, Suwon, Gyeonggi,
South Korea
Image Sensor
- sensor_type: CMOS
- resolution: VGA (640x480)
- dynamic_range: Not specified
- pixel_size: Not specified
- dark_current: Not specified
Optical Data
- focal_length: Not specified
- aperture: Not specified
- field_of_view: Not specified
- distortion: Not specified
Performance Metrics
Applications & Benefits
- cell_imaging: Not specified
-
benefits: Compact overall device size, low temperature
process suitable for mass production.
Supporting Organizations
-
supported_by: Samsung Electro-Mechanics Co., LTD.
Manuscript Details
- publication_date: 27-30 May 2008
Relevancy Score
- score: 9
-
missing_fields:
- dynamic_range
- pixel_size
- dark_current
- signal_to_noise_ratio
- focal_length
- aperture
- field_of_view
- distortion
- frame_rate
- sensitivity
- shutter_speed
- power_consumption
- noise
Processed JSON Filename
request_c02e9b32-b93e-4210-b64c-590c45469823-reflowable_ism_wlp.json