Proximity Gettering Technology For Advanced Cmos Image Sensors Using C3h5 Carbon Cluster Ion Implantation Techniques

• doi: 10.1109/EDTM.2017.7947538
• title: Proximity gettering technology for advanced CMOS image sensors using C3H5 carbon cluster Ion implantation techniques
• publisher: IEEE
• isbn: 978-1-5090-4661-4
• issn:
• rank: 3332
• access_type: LOCKED
• content_type: Conferences
• abstract: CMOS image sensor has been widely used for ubiquitous devices. However, CMOS image sensor devices performance is dramatically influenced by process induced defects such as metallic impurities contamination at devices active region during CMOS devices process. Thus, it is extremely important to study metallic impurities influence on CMOS image sensor devices performance and to develop effectiveness metallic impurities gettering techniques. We introduce our new proximity gettering technique for advanced CMOS image sensor using carbon cluster ion implantation technique. Furthermore, we demonstrated that the carbon cluster ion implanted silicon wafer has high gettering capability of metal, oxygen and hydrogen impurity during CMOS image sensor devices fabrication process.
• article_number: 7947538
• pdf_url: https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=7947538
• html_url: https://ieeexplore.ieee.org/document/7947538/
• abstract_url: https://ieeexplore.ieee.org/document/7947538/
• publication_title: 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM)
• conference_location: Toyama, Japan
• conference_dates: 28 Feb.-2 March 2017
• publication_number: 7939937
• is_number: 7947483
• publication_year: 2017
• publication_date: 28 Feb.-2 March 2017
• start_page: 105
• end_page: 106
• citing_paper_count: 1
• citing_patent_count: 0
• download_count: 315
• insert_date: 20170615
• index_terms:
  • ieee_terms:
    • Carbon
    • Impurities
    • Silicon
    • Ions
    • Gettering
    • Hydrogen
    • CMOS image sensors
  • author_terms:
    • Cluster
    • Gettering
    • Silicon wafer
  • dynamic_index_terms:
    • Carbon Clusters
    • Fabrication Process
    • Advanced Imaging
    • Silicon Wafer
    • Metal Contamination
    • Advanced Sensors
    • Device Fabrication Process
    • Device Manufacturing Process
    • Heat Treatment
    • Heat-treated
    • Secondary Ion Mass Spectrometry
    • Oxygen Profiles
• isbn_formats:
  • format: Print on Demand(PoD) ISBN, value: 978-1-5090-4661-4, isbnType: New-2005
  • format: Electronic ISBN, value: 978-1-5090-4660-7, isbnType: New-2005
• authors:
  • Author Name: Kazunari Kurita
    Affiliation: SUMCO Corporation, Imari-shi, Saga, Japan
    Author URL: https://ieeexplore.ieee.org/author/37086170826
    ID: 37086170826
    Order: 1
    Author Affiliations:
    • SUMCO Corporation, Imari-shi, Saga, Japan
  • Author Name: Takeshi Kadono
    Affiliation: SUMCO Corporation, Imari-shi, Saga, Japan
    Author URL: https://ieeexplore.ieee.org/author/37086167473
    ID: 37086167473
    Order: 2
    Author Affiliations:
    • SUMCO Corporation, Imari-shi, Saga, Japan
  • Author Name: Ryosuke Okuyama
    Affiliation: SUMCO Corporation, Imari-shi, Saga, Japan
    Author URL: https://ieeexplore.ieee.org/author/37086166253
    ID: 37086166253
    Order: 3
    Author Affiliations:
    • SUMCO Corporation, Imari-shi, Saga, Japan
  • Author Name: Ayumi Masada
    Affiliation: SUMCO Corporation, Imari-shi, Saga, Japan
    Author URL: https://ieeexplore.ieee.org/author/37086168722
    ID: 37086168722
    Order: 4
    Author Affiliations:
    • SUMCO Corporation, Imari-shi, Saga, Japan
  • Author Name: Ryou Hirose Yoshihiro Koga
    Affiliation: SUMCO Corporation, Imari-shi, Saga, Japan
    Author URL: https://ieeexplore.ieee.org/author/37087442243
    ID: 37087442243
    Order: 5
    Author Affiliations:
    • SUMCO Corporation, Imari-shi, Saga, Japan
  • Author Name: Hidehiko Okuda
    Affiliation: SUMCO Corporation, Imari-shi, Saga, Japan
    Author URL: https://ieeexplore.ieee.org/author/37086171122
    ID: 37086171122
    Order: 6
    Author Affiliations:
    • SUMCO Corporation, Imari-shi, Saga, Japan

Image Sensor

• sensor_type: CMOS
• resolution: Not specified
• dynamic_range: Not specified
• pixel_size: Not specified
• dark_current: Decreased dark current due to gettering techniques applied in production process.

Optical Data

• focal_length: Not specified
• aperture: Not specified
• field_of_view: Not specified
• distortion: Not specified

Performance Metrics

Applications & Benefits

• cell_imaging: Applicable for CMOS image sensors in various devices including smartphones, medical devices, and automotive systems.
• benefits: Effective means of decreasing defects and improving sensor performance.

Supporting Organizations

• supported_by: SUMCO Corporation

Manuscript Details

• publication_date: 28 Feb.-2 March 2017

Relevancy Score

• score: 10
• missing_fields:
  • resolution
  • dynamic_range
  • pixel_size
  • focal_length
  • aperture
  • field_of_view
  • distortion
  • frame_rate
  • signal_to_noise_ratio
  • sensitivity
  • shutter_speed
  • power_consumption
  • noise

Processed JSON Filename

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