Indepth Study Of 3D Colorresist Coating Process For Optically Uniform Image Sensors

• doi: 10.1109/ACCESS.2021.3121292
• title: In-Depth Study of 3D Color-Resist Coating Process for Optically Uniform Image Sensors
• publisher: IEEE
• isbn:
• issn: 2169-3536
• rank: 2762
• access_type: CCBY - IEEE is not the copyright holder of this material. Please follow the instructions via https://creativecommons.org/licenses/by/4.0/ to obtain full-text articles and stipulations in the API documentation.
• content_type: Journals
• abstract: The color filter required for manufacturing a CMOS image sensor was redeveloped to optimize its optical uniformity. An in-depth study of the three-dimensional (3D) coating process and how it gives rise to various radial-shaped striation patterns was conducted. These radial-shaped striation patterns were systematically investigated with reference to two types of patterns: the orthogonal type found only at the orthogonal edges of the wafer and the diagonal type found mostly at the corner of each quadrant. The formation of the orthogonal pattern was based on the wide standing wave created by the incident force of the spreading color photoresist (PR) and the reflective force from the bump pads acting as coating barriers. The diagonal pattern was found to be generated by the turbulent wakes created behind the bump pads by the drag force, which interfered with the coating flow. An in-depth study using Ansys CFX software and an in-line inspection tool revealed that lowering the viscosity of the color PR material is a key factor for improving the phenomenon whereby the 3D striation patterns of the orthogonal and diagonal types are formed. Based on this finding, it was possible to drastically reduce the formation of the 3D striation patterns by decreasing the viscosity of the material comprising each color PR. This study provides not only an empirical and theoretical understanding of the 3D color PR coating mechanism, but also guidelines for future color filter processes.
• article_number: 9586740
• pdf_url: https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9586740
• html_url: https://ieeexplore.ieee.org/document/9586740/
• abstract_url: https://ieeexplore.ieee.org/document/9586740/
• publication_title: IEEE Access
• conference_location:
• conference_dates:
• publication_number: 6287639
• is_number: 9312710
• publication_year: 2021
• publication_date: 2021
• start_page: 146525
• end_page: 146532
• citing_paper_count: 1
• citing_patent_count: 0
• download_count: 972
• insert_date: 20211026
• index_terms:
  • ieee_terms:
    • Image color analysis
    • Optical filters
    • Coatings
    • Three-dimensional displays
    • Optical sensors
    • Optical imaging
    • Color
  • author_terms:
    • CMOS image sensor
    • color filter process
    • spin coating
    • radial striation pattern
    • fluidic dynamics
    • process optimization
  • dynamic_index_terms:
    • Coatings
    • Image Sensor
    • Camera Sensor
    • Typical Pattern
    • Pattern Formation
    • Drag Force
    • Viscous Drag
    • Fluid Friction
    • Color Filter
    • Colour Filter
    • Viscosity Of The Material
    • Manufacturing Process
    • Boundary Layer
    • Shear Layer
    • Angular Velocity
    • Rotational Velocity
    • Fluid Dynamics
    • Inertial Forces
    • Effect Of Force
    • Radial Direction
    • Variable Thickness
    • Navier Stokes Equations
    • Navier-Stokes Equations
    • Orthogonal Directions
    • Viscous Forces
    • Recording Process
    • 3D Patterns
    • Highest Viscosity
    • Separation Angle
• authors:
  • Author Name: Sungjun Kim
    Affiliation: Foundry Business, Samsung Electronics Company, Kyunggi-do, South Korea
    Author URL: https://ieeexplore.ieee.org/author/37089019814
    ID: 37089019814
    Order: 1
    Author Affiliations:
    • Foundry Business, Samsung Electronics Company, Kyunggi-do, South Korea
    • Samsung Institute of Technology, Kyunggi-do, South Korea
    • Department of Semiconductor and Display Engineering, Sungkyunkwan University, Suwon-si, South Korea
  • Author Name: Jaesang Yoo
    Affiliation: Foundry Business, Samsung Electronics Company, Kyunggi-do, South Korea
    Author URL: https://ieeexplore.ieee.org/author/37089018726
    ID: 37089018726
    Order: 2
    Author Affiliations:
    • Foundry Business, Samsung Electronics Company, Kyunggi-do, South Korea
  • Author Name: Hakyu Choi
    Affiliation: Foundry Business, Samsung Electronics Company, Kyunggi-do, South Korea
    Author URL: https://ieeexplore.ieee.org/author/37089020014
    ID: 37089020014
    Order: 3
    Author Affiliations:
    • Foundry Business, Samsung Electronics Company, Kyunggi-do, South Korea
  • Author Name: Jaekwan Seo
    Affiliation: Foundry Business, Samsung Electronics Company, Kyunggi-do, South Korea
    Author URL: https://ieeexplore.ieee.org/author/37089020292
    ID: 37089020292
    Order: 4
    Author Affiliations:
    • Foundry Business, Samsung Electronics Company, Kyunggi-do, South Korea
  • Author Name: Sunghun Lee
    Affiliation: Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon-si, South Korea
    Author URL: https://ieeexplore.ieee.org/author/37089019616
    ID: 37089019616
    Order: 5
    Author Affiliations:
    • Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon-si, South Korea
  • Author Name: Sang Min Won
    Affiliation: Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon-si, South Korea
    Author URL: https://ieeexplore.ieee.org/author/37089019617
    ID: 37089019617
    Order: 6
    Author Affiliations:
    • Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon-si, South Korea
  • Author Name: Jin-Hong Park
    Affiliation: Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon-si, South Korea
    Author URL: https://ieeexplore.ieee.org/author/37635388900
    ID: 37635388900
    Order: 7
    Author Affiliations:
    • Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon-si, South Korea
  • Author Name: Keun Heo
    Affiliation: School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center, Jeonbuk National University, Jeonju-si, South Korea
    Author URL: https://ieeexplore.ieee.org/author/37089271994
    ID: 37089271994
    Order: 8
    Author Affiliations:
    • School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center, Jeonbuk National University, Jeonju-si, South Korea

Image Sensor

• sensor_type: CMOS
• resolution: not specified
• dynamic_range: not specified
• pixel_size: not specified
• dark_current: not specified

Optical Data

• focal_length: not specified
• aperture: not specified
• field_of_view: not specified
• distortion: not specified

Performance Metrics

Applications & Benefits

• cell_imaging: not specified
• benefits: not specified

Supporting Organizations

• supported_by: Ministry of Small and Medium Enterprises (SMEs) and Startups, Jeonbuk National University, and the Korea Government Ministry of Science, ICT & Future Planning.

Manuscript Details

• publication_date: 2021

Relevancy Score

• score: 9
• missing_fields:
  • resolution
  • dynamic_range
  • pixel_size
  • dark_current
  • frame_rate
  • signal_to_noise_ratio
  • sensitivity
  • shutter_speed
  • power_consumption
  • noise
  • focal_length
  • aperture
  • field_of_view
  • distortion
  • benefits

Processed JSON Filename

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