Fabrication Of Cmoscompatible Nanopillars For Smart Biomimetic Cmos Image Sensors

• doi: 10.1109/NEWCAS.2012.6329024
• title: Fabrication of CMOS-compatible nanopillars for smart bio-mimetic CMOS image sensors
• publisher: IEEE
• isbn: 978-1-4673-0858-8
• issn:
• partnum: 12EX6116
• rank: 2474
• access_type: LOCKED
• content_type: Conferences
• abstract: In this paper, nanopillars with heights of 1µm to 5µm and widths of 250nm to 500nm have been fabricated with a near room temperature etching process. The nanopillars were achieved with a continuous deep reactive ion etching technique and utilizing PMMA (polymethylmethacrylate) and Chromium as masking layers. As opposed to the conventional Bosch process, the usage of the unswitched deep reactive ion etching technique resulted in nanopillars with smooth sidewalls with a measured surface roughness of less than 40nm. Moreover, undercut was nonexistent in the nanopillars. The proposed fabrication method achieves etch rates four times faster when compared to the state-of-the-art, leading to higher throughput and more vertical side walls. The fabrication of the nanopillars was carried out keeping the CMOS process in mind to ultimately obtain a CMOS-compatible process. This work serves as an initial step in the ultimate objective of integrating photo-sensors based on these nanopillars seamlessly along with the controlling transistors to build a complete bio-inspired smart CMOS image sensor on the same wafer.
• article_number: 6329024
• pdf_url: https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=6329024
• html_url: https://ieeexplore.ieee.org/document/6329024/
• abstract_url: https://ieeexplore.ieee.org/document/6329024/
• publication_title: 10th IEEE International NEWCAS Conference
• conference_location: Montreal, QC, Canada
• conference_dates: 17-20 June 2012
• publication_number: 6324002
• is_number: 6328940
• publication_year: 2012
• publication_date: 17-20 June 2012
• start_page: 333
• end_page: 336
• citing_paper_count: 2
• citing_patent_count: 0
• download_count: 333
• insert_date: 20121011
• index_terms:
  • ieee_terms:
    • Etching
    • Fabrication
    • Silicon
    • Nanobioscience
    • CMOS integrated circuits
    • Biomedical imaging
    • Educational institutions
  • author_terms:
    • Nanopillars
    • Nano-Photo-Rod sensors
    • Bio-mimetic (bio-inspired) sensors
    • Unswitched etching
    • Mixed mode etching
    • Pseudo Bosch etching
    • Sensarvesting
    • Smart CMOS imager
    • light energy harvesting
  • dynamic_index_terms:
    • Image Sensor
    • Camera Sensor
    • Photodetector
    • Sidewall
    • Side Walls
    • Etching Process
    • Vertical Walls
    • Etching Rate
    • Etching Technique
    • Bosch Process
    • Scanning Electron Microscopy
    • Smoothing
    • Inductively Coupled Plasma
    • ICP-MS
    • Inductively Coupled Plasma Mass Spectrometry
    • Aspect Ratio
    • Process Parameters
    • Fabrication Process
    • Solar Cells
    • Energy Harvesting
    • Electron Beam Lithography
    • E-beam Lithography
    • Thermal Oxidation
    • Molecular Beam Epitaxy
    • Basal Width
• isbn_formats:
  • format: Online ISBN, value: 978-1-4673-0858-8, isbnType: New-2005
  • format: Print ISBN, value: 978-1-4673-0857-1, isbnType: New-2005
  • format: Electronic ISBN, value: 978-1-4673-0859-5, isbnType: New-2005
• authors:
  • Author Name: Fayçal Saffih
    Affiliation: Physical Science and Engineering, King Abdullah University for Science and Technology, Thuwal, Saudi Arabia
    Author URL: https://ieeexplore.ieee.org/author/37698301900
    ID: 37698301900
    Order: 1
    Author Affiliations:
    • Physical Science and Engineering, King Abdullah University for Science and Technology, Thuwal, Saudi Arabia
  • Author Name: Amro M. Elshurafa
    Affiliation: Physical Science and Engineering, King Abdullah University for Science and Technology, Thuwal, Saudi Arabia
    Author URL: https://ieeexplore.ieee.org/author/37275983400
    ID: 37275983400
    Order: 2
    Author Affiliations:
    • Physical Science and Engineering, King Abdullah University for Science and Technology, Thuwal, Saudi Arabia
  • Author Name: Mohammad Ali Mohammad
    Affiliation: Department of Electrical and Computer Engineering ECERF W2-085, University of Alberta Edmonton, AB, Canada
    Author URL: https://ieeexplore.ieee.org/author/37087823423
    ID: 37087823423
    Order: 3
    Author Affiliations:
    • Department of Electrical and Computer Engineering ECERF W2-085, University of Alberta Edmonton, AB, Canada
  • Author Name: Nathaniel Nelson-Fitzpatrick
    Affiliation: Institute for Quantum Computing, University of Waterloo, Waterloo, ONT, Canada
    Author URL: https://ieeexplore.ieee.org/author/38332686700
    ID: 38332686700
    Order: 4
    Author Affiliations:
    • Institute for Quantum Computing, University of Waterloo, Waterloo, ONT, Canada
  • Author Name: Stephane Evoy
    Affiliation: Department of Electrical and Computer Engineering ECERF W2-085, University of Alberta Edmonton, AB, Canada
    Author URL: https://ieeexplore.ieee.org/author/37319623800
    ID: 37319623800
    Order: 5
    Author Affiliations:
    • Department of Electrical and Computer Engineering ECERF W2-085, University of Alberta Edmonton, AB, Canada

Image Sensor

• sensor_type: CMOS
• resolution: Not explicitly mentioned
• dynamic_range: Not explicitly mentioned
• pixel_size: Not explicitly mentioned
• dark_current: Not explicitly mentioned

Optical Data

• focal_length: Not explicitly mentioned
• aperture: Not explicitly mentioned
• field_of_view: Not explicitly mentioned
• distortion: Not explicitly mentioned

Performance Metrics

• frame_rate: Not explicitly mentioned
• signal_to_noise_ratio: Not explicitly mentioned
• sensitivity: Not explicitly mentioned
• shutter_speed: Not explicitly mentioned
• power_consumption: Not explicitly mentioned
• noise: Not explicitly mentioned

Applications & Benefits

• cell_imaging: Nanopillars are proposed for use in CMOS image sensors, enhancing sensitivity and resolution due to their ability to sense light with a minimal footprint, akin to biological receptors in human vision.
• benefits: Integration of nanopillars into CMOS processes could result in higher image-sampling resolutions, improved imaging sensitivity, and reduced fabrication costs.

Supporting Organizations

• supported_by: King Abdullah University of Science and Technology (KAUST), University of Alberta

Manuscript Details

• publication_date: 17-20 June 2012

Relevancy Score

• score: 9
• missing_fields:
  • resolution
  • dynamic_range
  • pixel_size
  • dark_current
  • frame_rate
  • signal_to_noise_ratio
  • sensitivity
  • shutter_speed
  • power_consumption
  • noise
  • focal_length
  • aperture
  • field_of_view
  • distortion

Processed JSON Filename

request_2844619b-0a18-4469-b8fd-e7712bcca58e-fabrication_of_cmoscompatible_nanopillars_for_smart_biomimetic_cmos_image_sensors.json