Engineering Breakdown Probability Profile For Pdp And Dcr Optimization In
A Spad Fabricated In A Standard 55 Nm Bcd Process
- doi: 10.1109/JSTQE.2021.3114346
-
title: Engineering Breakdown Probability Profile for
PDP and DCR Optimization in a SPAD Fabricated in a Standard 55 nm BCD
Process
- publisher: IEEE
- isbn:
- issn: 1558-4542
- rank: 2390
- access_type: OPEN_ACCESS
- content_type: Journals
-
abstract: CMOS single-photon avalanche diodes (SPADs)
have broken into the mainstream by enabling the adoption of imaging,
timing, and security technologies in a variety of applications within
the consumer, medical and industrial domains. The continued scaling of
technology nodes creates many benefits but also obstacles for SPAD-based
systems. Maintaining and/or improving upon the high-sensitivity,
low-noise, and timing performance of demonstrated SPADs in custom
technologies or well-established CMOS image sensor processes remains a
challenge. In this paper, we present SPADs based on DPW/BNW junctions in
a standard Bipolar-CMOS-DMOS (BCD) technology with results comparable to
the state-of-the-art in terms of sensitivity and noise in a deep
sub-micron process. Technology CAD (TCAD) simulations demonstrate the
improved PDP with the simple addition of a single existing implant,
which allows for an engineered performance without modifications to the
process. The result is an 8.8 $\mu$m diameter SPAD exhibiting $\sim$2.6
cps/$\mu$m$^2$ DCR at 20 $^{\circ}$C with 7 V excess bias. The improved
structure obtains a PDP of 62% and $\sim$4.2% at 530 nm and 940 nm,
respectively. Afterpulsing probability is $\sim$0.97% and the timing
response is 52 ps FWHM when measured with integrated passive
quench/active recharge circuitry at 3 V excess bias.
- article_number: 9543572
-
pdf_url:
https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9543572
-
html_url:
https://ieeexplore.ieee.org/document/9543572/
-
abstract_url:
https://ieeexplore.ieee.org/document/9543572/
-
publication_title: IEEE Journal of Selected Topics in
Quantum Electronics
- conference_location:
- conference_dates:
- publication_number: 2944
- is_number: 9497052
- publication_year: 2022
- publication_date: March-April 2022
- start_page: 1
- end_page: 10
- citing_paper_count: 30
- citing_patent_count: 0
- download_count: 4979
- insert_date: 20210921
-
index_terms:
-
ieee_terms:
- Single-photon avalanche diodes
- Junctions
- Electric breakdown
- Implants
- Doping
- Photonics
- Timing
-
author_terms:
- Single-photon avalanche diodes (SPADs)
- photon counting
- depth-sensing
- BCD
- time-correlated single-photon counting(TCSPC)
- LIDAR
- three-dimensional (3-D) ranging
- FLIM
- QRNG
-
dynamic_index_terms:
- Single-photon Avalanche Diode
- Single Photon Avalanche Diode
- Dark Count Rate
- Bipolar-CMOS-DMOS Process
- Bipolar CMOS DMOS Process
- Variety Of Technologies
- Technological Diversity
- Multiple Regions
- Detection Efficiency
- Quantum Efficiency
- Oscilloscope
- Longer Wavelengths
- Longer Wavelength
- I-V Curves
- Current Voltage Characteristics
- I-V Characteristics
- Current-voltage Characteristics
- Space Charge
- Space-charge
- Depletion Region
- Space Charge Region
- Depletion Layer
- Depletion Zone
- Noise Characteristics
- Noise Features
- Time-correlated Single-photon Counting
- TCSPC
- Time-correlated Single Photon Counting
- Thermal Power Plants
- Thermal Generation
- Thermal Plants
- Fluorescence Lifetime Imaging Microscopy
- FLIM
- Fluorescence Lifetime Imaging
- Band Diagram
- Timing Jitter
- Time-to-digital Converter
- Device Physics
- Doping Profile
-
authors:
-
Author Name: Francesco Gramuglia
Affiliation: Advanced Quantum Architecture
Laboratory (AQUA), École Polytechnique Fédérale de Lausanne (EPFL),
Neuchâtel, Switzerland
Author URL:
https://ieeexplore.ieee.org/author/37086064963
ID: 37086064963
Order: 1
Author Affiliations:
-
Advanced Quantum Architecture Laboratory (AQUA), École
Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel,
Switzerland
-
Author Name: Pouyan Keshavarzian
Affiliation: Advanced Quantum Architecture
Laboratory (AQUA), École Polytechnique Fédérale de Lausanne (EPFL),
Neuchâtel, Switzerland
Author URL:
https://ieeexplore.ieee.org/author/37087240832
ID: 37087240832
Order: 2
Author Affiliations:
-
Advanced Quantum Architecture Laboratory (AQUA), École
Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel,
Switzerland
-
Author Name: Ekin Kizilkan
Affiliation: Advanced Quantum Architecture
Laboratory (AQUA), École Polytechnique Fédérale de Lausanne (EPFL),
Neuchâtel, Switzerland
Author URL:
https://ieeexplore.ieee.org/author/37086345143
ID: 37086345143
Order: 3
Author Affiliations:
-
Advanced Quantum Architecture Laboratory (AQUA), École
Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel,
Switzerland
-
Author Name: Claudio Bruschini
Affiliation: Advanced Quantum Architecture
Laboratory (AQUA), École Polytechnique Fédérale de Lausanne (EPFL),
Neuchâtel, Switzerland
Author URL:
https://ieeexplore.ieee.org/author/37274823200
ID: 37274823200
Order: 4
Author Affiliations:
-
Advanced Quantum Architecture Laboratory (AQUA), École
Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel,
Switzerland
-
Author Name: Shyue Seng Tan
Affiliation: GLOBALFOUNDRIES Singapore Pte. Ltd.,,
Singapore, Singapore
Author URL:
https://ieeexplore.ieee.org/author/37088993409
ID: 37088993409
Order: 5
Author Affiliations:
-
GLOBALFOUNDRIES Singapore Pte. Ltd.,, Singapore, Singapore
-
Author Name: Michelle Tng
Affiliation: GLOBALFOUNDRIES Singapore Pte. Ltd.,,
Singapore, Singapore
Author URL:
https://ieeexplore.ieee.org/author/37088472552
ID: 37088472552
Order: 6
Author Affiliations:
-
GLOBALFOUNDRIES Singapore Pte. Ltd.,, Singapore, Singapore
-
Author Name: Elgin Quek
Affiliation: GLOBALFOUNDRIES Singapore Pte. Ltd.,,
Singapore, Singapore
Author URL:
https://ieeexplore.ieee.org/author/37377421400
ID: 37377421400
Order: 7
Author Affiliations:
-
GLOBALFOUNDRIES Singapore Pte. Ltd.,, Singapore, Singapore
-
Author Name: Myung-Jae Lee
Affiliation: Post-Silicon Semiconductor Institute,
Korea Institute of Science and Technology (KIST), Seoul, South
Korea
Author URL:
https://ieeexplore.ieee.org/author/37598674000
ID: 37598674000
Order: 8
Author Affiliations:
-
Post-Silicon Semiconductor Institute, Korea Institute of Science
and Technology (KIST), Seoul, South Korea
-
Author Name: Edoardo Charbon
Affiliation: Advanced Quantum Architecture
Laboratory (AQUA), École Polytechnique Fédérale de Lausanne (EPFL),
Neuchâtel, Switzerland
Author URL:
https://ieeexplore.ieee.org/author/37271353200
ID: 37271353200
Order: 9
Author Affiliations:
-
Advanced Quantum Architecture Laboratory (AQUA), École
Polytechnique Fédérale de Lausanne (EPFL), Neuchâtel,
Switzerland
Image Sensor
- sensor_type: CMOS
- resolution: 8.8 µm diameter
- dynamic_range: Not explicitly mentioned.
- pixel_size: 8.8 µm
-
dark_current: ∼2.6 cps/µm² at 20°C with 7 V excess bias
(DCR)
Optical Data
- focal_length: Not mentioned.
- aperture: Not mentioned.
- field_of_view: Not mentioned.
- distortion: Not mentioned.
Performance Metrics
- frame_rate: Not mentioned.
- signal_to_noise_ratio: Not mentioned.
-
sensitivity: PDP of 62% at 530 nm and ∼4.2% at 940 nm.
- shutter_speed: Not mentioned.
- power_consumption: Not mentioned.
- noise: DCR of ∼2.6 cps/µm² at 7 V excess bias.
Applications & Benefits
-
cell_imaging: Enables applications in fluorescence
lifetime imaging microscopy (FLIM), LiDAR/Time-of-flight (ToF), and
quantum random number generation (QRNG).
-
benefits: High sensitivity and low noise performance
suitable for various applications in consumer, medical, and industrial
domains.
Supporting Organizations
-
supported_by: Swiss National Science Foundation under
Grant 200021-169465; Qrypt Inc.
Manuscript Details
- publication_date: March-April 2022
Relevancy Score
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