Effects Of Stacked Al2o3 Hfo2 Films Deposited In Deep Trench Isolation On White Pixels Noise

• doi: 10.1109/CSTIC55103.2022.9856838
• title: Effects of Stacked Al2O3 / HFO2 Films Deposited in Deep Trench Isolation on White Pixels Noise
• publisher: IEEE
• isbn: 978-1-6654-9759-6
• issn:
• rank: 2355
• access_type: LOCKED
• content_type: Conferences
• abstract: In the stacked-BSI CMOS image sensor process, deposition of high-k thin films in deep trench isolation (DTI) to further reduce white pixels noise has attracted lots of attention. In this paper, we explore the influence of stacked two films of Al2O3/HfO2 on the white pixel properties of the CMOS image sensor. Here, the two oxide layers are deposited using PEALD. We found that the as-deposited Al2O3 / HfO2 (TH1/TH1) films show a suppression of the white pixels up to 175 PPM(P95). This achievement could open a possible way to remarkably further reduce the white pixels noise.
• article_number: 9856838
• pdf_url: https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9856838
• html_url: https://ieeexplore.ieee.org/document/9856838/
• abstract_url: https://ieeexplore.ieee.org/document/9856838/
• publication_title: 2022 China Semiconductor Technology International Conference (CSTIC)
• conference_location: Shanghai, China
• conference_dates: 20-21 June 2022
• publication_number: 9856647
• is_number: 9856709
• publication_year: 2022
• publication_date: 20-21 June 2022
• start_page: 1
• end_page: 3
• citing_paper_count: 0
• citing_patent_count: 0
• download_count: 871
• insert_date: 20220823
• index_terms:
  • ieee_terms:
    • Films
    • CMOS image sensors
    • Hafnium compounds
    • High-k dielectric materials
    • Leakage currents
    • Aluminum oxide
    • Diffusion tensor imaging
  • dynamic_index_terms:
    • White Noise
    • White Pixels
    • Deep Trench Isolation
    • Thin Films
    • Alumina
    • Charge Density
    • Charge Distribution
    • Sidewall
    • Side Walls
    • Silicon Wafer
    • Deep Groove
    • Oxygen Source
    • Si Surface
    • Al2O3 Layer
    • Interfacial Density
• isbn_formats:
  • format: Print on Demand(PoD) ISBN, value: 978-1-6654-9759-6, isbnType: New-2005
  • format: USB ISBN, value: 978-1-6654-9757-2, isbnType: New-2005
  • format: Electronic ISBN, value: 978-1-6654-9758-9, isbnType: New-2005
• authors:
  • Author Name: Qixin Wu
    Affiliation: University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
    Author URL: https://ieeexplore.ieee.org/author/37089498998
    ID: 37089498998
    Order: 1
    Author Affiliations:
    • University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
  • Author Name: Hebao Liu
    Affiliation: University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
    Author URL: https://ieeexplore.ieee.org/author/37089498006
    ID: 37089498006
    Order: 2
    Author Affiliations:
    • University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
  • Author Name: Haitao Jin
    Affiliation: University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
    Author URL: https://ieeexplore.ieee.org/author/37089498811
    ID: 37089498811
    Order: 3
    Author Affiliations:
    • University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
  • Author Name: Felix Li
    Affiliation: University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
    Author URL: https://ieeexplore.ieee.org/author/37089498668
    ID: 37089498668
    Order: 4
    Author Affiliations:
    • University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
  • Author Name: Enjoy Yin
    Affiliation: University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
    Author URL: https://ieeexplore.ieee.org/author/37089499071
    ID: 37089499071
    Order: 5
    Author Affiliations:
    • University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
  • Author Name: Horse Ma
    Affiliation: University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
    Author URL: https://ieeexplore.ieee.org/author/37089496140
    ID: 37089496140
    Order: 6
    Author Affiliations:
    • University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
  • Author Name: Xinhe Zheng
    Affiliation: University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China
    Author URL: https://ieeexplore.ieee.org/author/37089497308
    ID: 37089497308
    Order: 7
    Author Affiliations:
    • University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation, Beijing, P. R. China

Image Sensor

• sensor_type: CMOS
• resolution: not specified
• dynamic_range: not specified
• pixel_size: not specified
• dark_current: not specified

Optical Data

• focal_length: not specified
• aperture: not specified
• field_of_view: not specified
• distortion: not specified

Performance Metrics

Applications & Benefits

• cell_imaging: CMOS sensors are used in cell imaging applications as part of digital imaging systems.
• benefits: Enable digital imaging in smartphones, medical devices, and automotive systems.

Supporting Organizations

• supported_by: University of Science and Technology Beijing, Semiconductor Manufacturing International Corporation

Manuscript Details

• publication_date: 20-21 June 2022

Relevancy Score

• score: 9
• missing_fields:
  • resolution
  • dynamic_range
  • pixel_size
  • dark_current
  • frame_rate
  • signal_to_noise_ratio
  • sensitivity
  • shutter_speed
  • power_consumption
  • noise
  • focal_length
  • aperture
  • field_of_view
  • distortion

Processed JSON Filename

request_36a67168-14c0-4175-a1f2-9b96acd4facf-effects_of_stacked_al2o3__hfo2_films_deposited_in_deep_trench_isolation_on_white_pixels_noise.json