Dedicated Process Architecture And The Characteristics Of 14 M Pixel Cmos Image Sensor With 8M Density

• doi: 10.1109/VLSIT.2007.4339728
• title: Dedicated process architecture and the characteristics of 1.4 μm pixel CMOS image sensor with 8M density
• publisher: IEEE
• isbn: 978-4-900784-03-1
• issn: 2158-9682
• partnum: 07CH37851
• rank: 2057
• access_type: LOCKED
• content_type: Conferences
• abstract: A 1.4 μm-pitch pixel of CMOS image sensor, which is the smallest to date, has been successfully developed and integrated into 8M density for the first time. To overcome the crucial degradation of the saturation charge and sensitivity, a novel photodiode structure extended under transfer gate and an elaborate optical design including very thin tungsten pixel routing with 65 nm-grade design rules are introduced, which result in enhanced electrical and optical performance.
• article_number: 4339728
• pdf_url: https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=4339728
• html_url: https://ieeexplore.ieee.org/document/4339728/
• abstract_url: https://ieeexplore.ieee.org/document/4339728/
• publication_title: 2007 IEEE Symposium on VLSI Technology
• conference_location: Kyoto, Japan
• conference_dates: 12-14 June 2007
• publication_number: 4339664
• is_number: 4339665
• publication_year: 2007
• publication_date: 12-14 June 2007
• start_page: 62
• end_page: 63
• citing_paper_count: 4
• citing_patent_count: 0
• download_count: 222
• insert_date: 20071008
• index_terms:
  • ieee_terms:
    • Pixel
    • CMOS image sensors
    • Very large scale integration
    • Paper technology
  • dynamic_index_terms:
    • Image Sensor
    • Camera Sensor
    • Photodiode
    • Quantum Efficiency
    • Blackbody
    • Blackbody Radiation
    • Pixel Pitch
    • Small Pitch
    • 65-nm CMOS
• isbn_formats:
  • format: Print ISBN, value: 978-4-900784-03-1, isbnType: New-2005
• authors:
  • Author Name: Chang-Rok Moon
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37287589400
    ID: 37287589400
    Order: 1
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Jong-Cheol Shin
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37088672730
    ID: 37088672730
    Order: 2
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Jinho Kim
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37293482100
    ID: 37293482100
    Order: 3
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Yun Ki Lee
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/38190512200
    ID: 38190512200
    Order: 4
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Young-Joon Cho
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37088675193
    ID: 37088675193
    Order: 5
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Yu-Yeon Yu
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37088672667
    ID: 37088672667
    Order: 6
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Seong-Ho Hwang
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37065054300
    ID: 37065054300
    Order: 7
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Doo-Cheol Park
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37289701400
    ID: 37289701400
    Order: 8
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Byung Jun Park
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37086251238
    ID: 37086251238
    Order: 9
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Hwang-Yoon Kim
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37088673395
    ID: 37088673395
    Order: 10
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Seok-Ha Lee
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37076724100
    ID: 37076724100
    Order: 11
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Jongwan Jung
    Affiliation: Department of Nano Science and Technology, Sejong University, Seoul, Korea
    Author URL: https://ieeexplore.ieee.org/author/37067955000
    ID: 37067955000
    Order: 12
    Author Affiliations:
    • Department of Nano Science and Technology, Sejong University, Seoul, Korea
  • Author Name: Seong-Ho Cho
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37088673885
    ID: 37088673885
    Order: 13
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Kangbok Lee
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37281497700
    ID: 37281497700
    Order: 14
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Kwangok Koh
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37089125174
    ID: 37089125174
    Order: 15
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Duckhyung Lee
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/38581226400
    ID: 38581226400
    Order: 16
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
  • Author Name: Kinam Kim
    Affiliation: Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA
    Author URL: https://ieeexplore.ieee.org/author/37280248100
    ID: 37280248100
    Order: 17
    Author Affiliations:
    • Technology Development, Samsung Electronics Co., Yongin-City, Gyeonggi-Do, KOREA

Image Sensor

• sensor_type: CMOS
• resolution: varies by application
• dynamic_range: varies by application
• pixel_size: varies by design
• dark_current: varies by design

Optical Data

• focal_length: varies by lens
• aperture: varies by lens type
• field_of_view: varies by lens
• distortion: varies by lens characteristics

Performance Metrics

• frame_rate: varies by application
• signal_to_noise_ratio: varies by design
• sensitivity: varies by sensor type
• shutter_speed: varies by design
• power_consumption: varies by application
• noise: includes temporal noise and fixed-pattern noise

Applications & Benefits

• cell_imaging: Used in medical imaging for cell analysis and diagnostics.
• benefits: High sensitivity and resolution for accurate imaging.

Supporting Organizations

• supported_by: Research institutions and semiconductor manufacturers

Manuscript Details

• publication_date: 12-14 June 2007

Relevancy Score

• score: 9
• missing_fields:
  • authors
  • manuscript_details.publication_date

Processed JSON Filename

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