Advanced Black Resist Processing And Optimized Lithographic Patterning For Novel Photonic Devices

• doi: 10.23919/IWLPC.2019.8914139
• title: Advanced Black Resist Processing and Optimized Lithographic Patterning for Novel Photonic Devices
• publisher: IEEE
• isbn: 978-1-7281-4583-9
• issn:
• rank: 1410
• access_type: LOCKED
• content_type: Conferences
• abstract: CMOS image sensors technology is nowadays widely used in various applications due to multiple advantages, such as low cost, low power consumption, on chip functionality, high-speed of operation [1]. The market for CMOS image sensor (CIS) technology is continuously growing, as this technology is key technology in the most of the main electronic megatrends, such as smart automotive, portable & mobile electronics, novel human machine interfaces for AR/ VR devices, 3D sensing or μ-displays and advanced healthcare requirements. In order to follow and continue CIS scaling for thinner and smaller devices, an adoption of new processes and materials is required. Mainly improving optical performance as well as imagining characteristics of image sensors, such as higher image resolution, better contrast and desired optical density of the colored resist materials are key aspects of today's development.
• article_number: 8914139
• pdf_url: https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=8914139
• html_url: https://ieeexplore.ieee.org/document/8914139/
• abstract_url: https://ieeexplore.ieee.org/document/8914139/
• publication_title: 2019 International Wafer Level Packaging Conference (IWLPC)
• conference_location: San Jose, CA, USA
• conference_dates: 22-24 Oct. 2019
• publication_number: 8902179
• is_number: 8913841
• publication_year: 2019
• publication_date: 22-24 Oct. 2019
• start_page: 1
• end_page: 6
• citing_paper_count: 0
• citing_patent_count: 0
• download_count: 116
• insert_date: 20191128
• index_terms:
  • ieee_terms:
    • Resists
    • Surface treatment
    • Coatings
    • Optical surface waves
    • Surface topography
    • Rough surfaces
    • Surface roughness
  • author_terms:
    • black resist
    • spin coating
    • spray coating
    • photonic applications
    • lens shielding
    • black matrix
  • dynamic_index_terms:
    • Photonic Devices
    • Lithographic Patterning
    • Image Sensor
    • Camera Sensor
    • Optical Performance
    • Layer Thickness
    • Visible Light
    • Visible Region
    • Visible Spectrum
    • Visible-light
    • Precise Control
    • Spin-coated
    • Spin Coating
    • Substrate Surface
    • Range Of Spectrum
    • Optical Density Values
    • Metal Layer
    • Metallic Layer
    • Photomultiplier Tube
    • Light Reflection
    • Optical Materials
    • Test Examples
    • Transmittance Values
    • Black Cloth
    • Black Clothes
    • Black Fabric
    • Black Material
    • Photonic Applications
    • Glass Wafer
    • Resolution Test
    • Spin-coating Method
    • Spin-coating Methods
    • Spin Coating Method
    • Mask Aligner
    • Contact Aligner
    • Resolution Of Patterns
    • Uniform Coatings
    • Application Requirements
    • Applicable Requirements
• isbn_formats:
  • format: Print on Demand(PoD) ISBN, value: 978-1-7281-4583-9, isbnType: New-2005
  • format: Electronic ISBN, value: 978-1-944543-12-9, isbnType: New-2005
• authors:
  • Author Name: B. Matuskova
    Affiliation: EV Group, St. Florian am Inn, Austria
    Author URL: https://ieeexplore.ieee.org/author/37087104416
    ID: 37087104416
    Order: 1
    Author Affiliations:
    • EV Group, St. Florian am Inn, Austria
  • Author Name: M. Weinhart
    Affiliation: EV Group, St. Florian am Inn, Austria
    Author URL: https://ieeexplore.ieee.org/author/37088825362
    ID: 37088825362
    Order: 2
    Author Affiliations:
    • EV Group, St. Florian am Inn, Austria
  • Author Name: R. Holly
    Affiliation: EV Group, St. Florian am Inn, Austria
    Author URL: https://ieeexplore.ieee.org/author/37087108556
    ID: 37087108556
    Order: 3
    Author Affiliations:
    • EV Group, St. Florian am Inn, Austria
  • Author Name: M. Brunnbauer
    Affiliation: EV Group, St. Florian am Inn, Austria
    Author URL: https://ieeexplore.ieee.org/author/37088825464
    ID: 37088825464
    Order: 4
    Author Affiliations:
    • EV Group, St. Florian am Inn, Austria
  • Author Name: J. Rimböck
    Affiliation: EV Group, St. Florian am Inn, Austria
    Author URL: https://ieeexplore.ieee.org/author/37086696449
    ID: 37086696449
    Order: 5
    Author Affiliations:
    • EV Group, St. Florian am Inn, Austria
  • Author Name: T. Zenger
    Affiliation: EV Group, St. Florian am Inn, Austria
    Author URL: https://ieeexplore.ieee.org/author/37086695672
    ID: 37086695672
    Order: 6
    Author Affiliations:
    • EV Group, St. Florian am Inn, Austria
  • Author Name: M. Eibelhuber
    Affiliation: EV Group, St. Florian am Inn, Austria
    Author URL: https://ieeexplore.ieee.org/author/37085523849
    ID: 37085523849
    Order: 7
    Author Affiliations:
    • EV Group, St. Florian am Inn, Austria
  • Author Name: T. Uhrmann
    Affiliation: EV Group, St. Florian am Inn, Austria
    Author URL: https://ieeexplore.ieee.org/author/37394992300
    ID: 37394992300
    Order: 8
    Author Affiliations:
    • EV Group, St. Florian am Inn, Austria
  • Author Name: Y. Taguchi
    Affiliation: FUJIFILM Electronic Materials Co., Ltd. (FFEM), Shizuoka, Japan
    Author URL: https://ieeexplore.ieee.org/author/37088826177
    ID: 37088826177
    Order: 9
    Author Affiliations:
    • FUJIFILM Electronic Materials Co., Ltd. (FFEM), Shizuoka, Japan
  • Author Name: H. Taguchi
    Affiliation: FUJIFILM Electronic Materials Co., Ltd. (FFEM), Shizuoka, Japan
    Author URL: https://ieeexplore.ieee.org/author/37088824812
    ID: 37088824812
    Order: 10
    Author Affiliations:
    • FUJIFILM Electronic Materials Co., Ltd. (FFEM), Shizuoka, Japan

Image Sensor

• sensor_type: CMOS
• resolution: Not specified
• dynamic_range: Not specified
• pixel_size: Not specified
• dark_current: Not specified

Optical Data

• focal_length: Not specified
• aperture: Not specified
• field_of_view: Not specified
• distortion: Not specified

Performance Metrics

Applications & Benefits

• cell_imaging: CMOS image sensors enable digital imaging in applications such as smartphones, medical devices, and automotive systems.
• benefits: Benefits include low cost, low power consumption, on-chip functionality, and high-speed operation.

Supporting Organizations

• supported_by: EV Group, FUJIFILM Electronic Materials Co., Ltd.

Manuscript Details

• publication_date: 22-24 Oct. 2019

Relevancy Score

• score: 8
• missing_fields:
  • resolution
  • dynamic_range
  • pixel_size
  • dark_current
  • focal_length
  • aperture
  • field_of_view
  • distortion
  • frame_rate
  • signal_to_noise_ratio
  • sensitivity
  • shutter_speed
  • power_consumption
  • noise

Processed JSON Filename

request_2984d052-b09a-451a-9980-56cf605b9142-advanced_black_resist_processing_and_optimized_lithographic_patterning_for_novel_photonic_devices.json