A Fully Automated Vpd System For Noble Metal Control During Cis Manufacturing

• doi: 10.1109/CSTIC61820.2024.10531961
• title: A Fully Automated VPD System for Noble Metal Control During CIS Manufacturing
• publisher: IEEE
• isbn: 979-8-3503-6220-6
• issn:
• rank: 716
• access_type: LOCKED
• content_type: Conferences
• abstract: Metallic contamination has long been reported as a source of defects for most semiconductor devices, and its impacts on complementary metal-oxide-semiconductor (CMOS) image sensors (CISs) are especially detrimental. These contaminants could be introduced during the CIS fabrication, such as ion implantation process [1]–[2]. Wafer surface concentration of certain noble metals, including Au, Ag, and Pt, needs to be controlled to no more than 0.05 to 0.2 ppt [6]. Conventional methods of metal trace analysis involve chemically collecting these elements into a scanning solution, and analyzing the diluted scanning solution by inductively coupled plasma mass spectroscopy (ICP-MS). However, detecting the concentration of noble metals on wafer surface has been particularly challenging, due to their low solubility in scanning solutions. In this paper, the authors proposed a method to effectively collect the noble metals, especially silver and gold, with an aqua regia (AR) based scanning solution to increase the collection efficiency (CE). Combined with a vapor phase decomposition (VPD) treatment of the wafer surface, and an integrated ICP-MS analysis, our fully automated method of AR based noble metal collection is of great importance to control the noble metal contamination for CIS manufacturing.
• article_number: 10531961
• pdf_url: https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10531961
• html_url: https://ieeexplore.ieee.org/document/10531961/
• abstract_url: https://ieeexplore.ieee.org/document/10531961/
• publication_title: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC)
• conference_location: Shanghai, China
• conference_dates: 17-18 March 2024
• publication_number: 10531806
• is_number: 10531771
• publication_year: 2024
• publication_date: 17-18 March 2024
• start_page: 1
• end_page: 04
• citing_paper_count: 0
• citing_patent_count: 0
• download_count: 96
• insert_date: 20240522
• index_terms:
  • ieee_terms:
    • Gold
    • Silver
    • Surface contamination
    • Semiconductor devices
    • Metals
    • Mass spectroscopy
    • Plasmas
  • author_terms:
    • Vapor Phase Decomposition (VPD)
    • Noble metal contamination
    • Silver
    • Gold
    • Aqua Regia
    • Inductively Coupled Plasma Mass Spectroscopy (ICP-MS)
    • CMOS image sensor (CIS)
  • dynamic_index_terms:
    • Noble Metal
    • Image Sensor
    • Camera Sensor
    • Metal Contamination
    • Semiconductor Devices
    • Aqua Regia
    • Wafer Surface
    • Element Concentrations
    • Hydrofluoric Acid
    • HF Acid
    • Solution Ratio
    • Non-noble Metal
    • Successive Scans
• isbn_formats:
  • format: Print on Demand(PoD) ISBN, value: 979-8-3503-6220-6, isbnType: New-2005
  • format: Electronic ISBN, value: 979-8-3503-6219-0, isbnType: New-2005
• authors:
  • Author Name: Qiao Huang
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/37089988767
    ID: 37089988767
    Order: 1
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Hushan Cui
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/37085579199
    ID: 37085579199
    Order: 2
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Zhiwen Zou
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/38060749100
    ID: 38060749100
    Order: 3
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Shiran Cheng
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/165680670575793
    ID: 165680670575793
    Order: 4
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Lei Zhu
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/103021884479143
    ID: 103021884479143
    Order: 5
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Hao Zhang
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/997686794555045
    ID: 997686794555045
    Order: 6
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Chaobo Xue
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/592502543710772
    ID: 592502543710772
    Order: 7
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Jiali Feng
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/37086335464
    ID: 37086335464
    Order: 8
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Qiang Hua
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/897039703204062
    ID: 897039703204062
    Order: 9
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Xiaoqing Zhu
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/762493411753364
    ID: 762493411753364
    Order: 10
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Wuping Liu
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/37089839402
    ID: 37089839402
    Order: 11
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
  • Author Name: Kaidong Xu
    Affiliation: Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China
    Author URL: https://ieeexplore.ieee.org/author/37087069709
    ID: 37087069709
    Order: 12
    Author Affiliations:
    • Jiangsu Leuven Instruments Co. Ltd, Xuzhou, Jiangsu, China

Image Sensor

• sensor_type: CMOS
• resolution: not specified
• dynamic_range: not specified
• pixel_size: not specified
• dark_current: characterized by level of background noise signal, specific value not provided

Optical Data

• focal_length: not specified
• aperture: not specified
• field_of_view: not specified
• distortion: not specified

Performance Metrics

• noise: not explicitly quantified but discussed

Applications & Benefits

• cell_imaging: widely used in applications such as mobile phones, digital cameras, webcams, and automobiles
• benefits: enables digital imaging, enhances light to electrical signal conversion

Supporting Organizations

• supported_by: not specified

Manuscript Details

• publication_date: 17-18 March 2024

Relevancy Score

• score: 10
• missing_fields:
  • resolution
  • dynamic_range
  • pixel_size
  • frame_rate
  • signal_to_noise_ratio
  • sensitivity
  • shutter_speed
  • power_consumption
  • focal_length
  • aperture
  • field_of_view
  • distortion

Processed JSON Filename

request_1ae0994a-a55a-4354-847c-b1af3e69d034-a_fully_automated_vpd_system_for_noble_metal_control_during_cis_manufacturing.json