A 70Db Snr Highspeed Global Shutter Cmos Image Sensor For In Situ Fluid Concentration Distribution Measurements

• doi: 10.1109/TED.2022.3165520
• title: A 70-dB SNR High-Speed Global Shutter CMOS Image Sensor for in Situ Fluid Concentration Distribution Measurements
• publisher: IEEE
• isbn:
• issn: 1557-9646
• rank: 506
• access_type: CCBY - IEEE is not the copyright holder of this material. Please follow the instructions via https://creativecommons.org/licenses/by/4.0/ to obtain full-text articles and stipulations in the API documentation.
• content_type: Journals
• abstract: This article presents a global shutter (GS) high signal-to-noise ratio (SNR) and a high-frame-rate CMOS image sensor (CIS) for in situ fluid concentration distribution measurements using absorption imaging. The pixel consists of a ultraviolet (UV)-visible-near infrared (NIR) waveband pinned photodiode (PD) with high robustness against UV light irradiation for various measurement objects, two-stage lateral overflow integration capacitors (LOFIC) for high dynamic range and high SNR, and a voltage-domain memory bank for GS. The developed prototype CIS with 22.4- $\mu \text{m}$ pitch pixels exhibited 69.7-dB maximum SNR, 123-dB dynamic range, and 1000-frames/s maximum frame rate under single exposure GS and successfully captured images of dynamic movement of NO2 gas concentration distribution in the vacuum chamber for 300-mm-diameter wafers.
• article_number: 9760040
• pdf_url: https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9760040
• html_url: https://ieeexplore.ieee.org/document/9760040/
• abstract_url: https://ieeexplore.ieee.org/document/9760040/
• publication_title: IEEE Transactions on Electron Devices
• conference_location:
• conference_dates:
• publication_number: 16
• is_number: 9780469
• publication_year: 2022
• publication_date: June 2022
• start_page: 2965
• end_page: 2972
• citing_paper_count: 5
• citing_patent_count: 0
• download_count: 2026
• insert_date: 20220419
• index_terms:
  • ieee_terms:
    • Signal to noise ratio
    • Capacitors
    • Sensitivity
    • Semiconductor device measurement
    • Absorption
    • Imaging
    • Analog memory
  • author_terms:
    • Absorption imaging
    • CMOS image sensor (CIS)
    • global shutter (GS)
    • lateral overflow integration capacitor (LOFIC)
    • signal-to-noise ratio (SNR)
    • wide dynamic range (WDR)
  • dynamic_index_terms:
    • Concentration Distribution
    • Image Sensor
    • Camera Sensor
    • Global Shutter
    • Dynamic Range
    • Near-infrared
    • Gas Concentration
    • Gas Absorption
    • Vacuum Chamber
    • High Robustness
    • High Signal-to-noise Ratio
    • High Signal To Noise Ratio
    • High Dynamic Range
    • High-dynamic-range
    • Memory Bank
    • NO2 Gas
    • Gaseous NO2
    • Maximum Frame Rate
    • Maximal Frame
    • Absorption Images
    • Absorption Tomography
    • PIN Photodiode
    • Light Source
    • Light Absorption
    • Processing Conditions
    • Integration Time
    • Chemical Vapor Deposition
    • Vapor Deposition
    • Chemical Vapour Deposition
    • Chemical Deposition
    • Total Noise
    • Signal Readout
    • Atomic Layer Deposition
    • Switching Point
    • Reset Gate
    • Inversion Layer
    • Semiconductor Industry
    • Semiconductor Manufacturing
    • Semiconductor Fabrication
    • High Saturation
    • Dark Current
    • High Illumination
• authors:
  • Author Name: Tetsu Oikawa
    Affiliation: Graduate School of Engineering, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37089389572
    ID: 37089389572
    Order: 1
    Author Affiliations:
    • Graduate School of Engineering, Tohoku University, Sendai, Japan
  • Author Name: Rihito Kuroda
    Affiliation: Graduate School of Engineering, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37294742300
    ID: 37294742300
    Order: 2
    Author Affiliations:
    • Graduate School of Engineering, Tohoku University, Sendai, Japan
    • New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
  • Author Name: Keigo Takahashi
    Affiliation: Graduate School of Engineering, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37089390245
    ID: 37089390245
    Order: 3
    Author Affiliations:
    • Graduate School of Engineering, Tohoku University, Sendai, Japan
  • Author Name: Yoshinobu Shiba
    Affiliation: Fujikin Inc., Osaka, Japan
    Author URL: https://ieeexplore.ieee.org/author/37085990809
    ID: 37085990809
    Order: 4
    Author Affiliations:
    • Fujikin Inc., Osaka, Japan
  • Author Name: Yasuyuki Fujihara
    Affiliation: Graduate School of Engineering, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37086139032
    ID: 37086139032
    Order: 5
    Author Affiliations:
    • Graduate School of Engineering, Tohoku University, Sendai, Japan
  • Author Name: Hiroya Shike
    Affiliation: Graduate School of Engineering, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37088811463
    ID: 37088811463
    Order: 6
    Author Affiliations:
    • Graduate School of Engineering, Tohoku University, Sendai, Japan
  • Author Name: Maasa Murata
    Affiliation: Graduate School of Engineering, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37086597404
    ID: 37086597404
    Order: 7
    Author Affiliations:
    • Graduate School of Engineering, Tohoku University, Sendai, Japan
  • Author Name: Chia-Chi Kuo
    Affiliation: Graduate School of Engineering, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37089388221
    ID: 37089388221
    Order: 8
    Author Affiliations:
    • Graduate School of Engineering, Tohoku University, Sendai, Japan
  • Author Name: Yhang Ricardo Sipauba Carvalho da Silva
    Affiliation: Graduate School of Engineering, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37089390588
    ID: 37089390588
    Order: 9
    Author Affiliations:
    • Graduate School of Engineering, Tohoku University, Sendai, Japan
  • Author Name: Tetsuya Goto
    Affiliation: New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37573141600
    ID: 37573141600
    Order: 10
    Author Affiliations:
    • New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
  • Author Name: Tomoyuki Suwa
    Affiliation: New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37408015800
    ID: 37408015800
    Order: 11
    Author Affiliations:
    • New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
  • Author Name: Tatsuo Morimoto
    Affiliation: New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37089115081
    ID: 37089115081
    Order: 12
    Author Affiliations:
    • New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
  • Author Name: Yasuyuki Shirai
    Affiliation: New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37085996889
    ID: 37085996889
    Order: 13
    Author Affiliations:
    • New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
  • Author Name: Takafumi Inada
    Affiliation: Fujikin Inc., Osaka, Japan
    Author URL: https://ieeexplore.ieee.org/author/37089390185
    ID: 37089390185
    Order: 14
    Author Affiliations:
    • Fujikin Inc., Osaka, Japan
  • Author Name: Yushi Sakai
    Affiliation: Fujikin Inc., Osaka, Japan
    Author URL: https://ieeexplore.ieee.org/author/37089388436
    ID: 37089388436
    Order: 15
    Author Affiliations:
    • Fujikin Inc., Osaka, Japan
  • Author Name: Masaaki Nagase
    Affiliation: Fujikin Inc., Osaka, Japan
    Author URL: https://ieeexplore.ieee.org/author/37085994360
    ID: 37085994360
    Order: 16
    Author Affiliations:
    • Fujikin Inc., Osaka, Japan
  • Author Name: Nobukazu Ikeda
    Affiliation: Fujikin Inc., Osaka, Japan
    Author URL: https://ieeexplore.ieee.org/author/37085992703
    ID: 37085992703
    Order: 17
    Author Affiliations:
    • Fujikin Inc., Osaka, Japan
  • Author Name: Shigetoshi Sugawa
    Affiliation: New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan
    Author URL: https://ieeexplore.ieee.org/author/37284703100
    ID: 37284703100
    Order: 18
    Author Affiliations:
    • New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan

Image Sensor

• sensor_type: CMOS
• resolution: 140x140
• dynamic_range: 123 dB
• pixel_size: 22.4 μm
• dark_current: 18 e− rms

Optical Data

• focal_length: Not specified
• aperture: Not specified
• field_of_view: Not specified
• distortion: Not specified

Performance Metrics

• frame_rate: 1000 fps
• signal_to_noise_ratio: 69.7 dB
• noise: 6.5 e− rms temporal noise,2.3 e− rms kTC noise

Applications & Benefits

• cell_imaging: In situ fluid concentration distribution measurements for various applications such as semiconductor manufacturing process control.
• benefits: High SNR and high frame rate allow for accurate gas concentration distribution measurements.

Supporting Organizations

• supported_by: New Energy and Industrial Technology Development Organization (NEDO)

Manuscript Details

• publication_date: June 2022

Relevancy Score

• score: 10

Processed JSON Filename

request_03cfb940-ac1d-47d5-804d-5897c8649e6d-a_70db_snr_highspeed_global_shutter_cmos_image_sensor_for_in_situ_fluid_concentration_distribution_measurements.json